Document Type
Thesis
Date of Award
10-31-1983
Degree Name
Master of Science in Chemical Engineering - (M.S.)
Department
Chemical Engineering and Chemistry
First Advisor
Ching-Rong Huang
Second Advisor
Gordon Lewandowski
Third Advisor
Joseph W. Bozzelli
Abstract
A photoreactor has been designed to oxidize refractory chemicals found in water using ozone and ultraviolet radiation. The feasibility of the ozone/UV process has been examined by conducting experiments with three model compounds, namely, (1) o-chlorophenol (2) m-chlorophenol and (3) p-chloro phenol. For o-chlorophenol and p-chloro-phenol, reactions were very fast with ozone/UV oxidation and somewhat slower with m-chlorophenol. It is concluded that UV irradiation increases the decomposition of ozone and the resulting unstable intermediates are much more reactive than ozone. Ultraviolet light also helps in decomposing the substrate molecules. The effect of UV upon decomposition of ozone is more pronounced than the substrate decomposition in most cases.
Mathematical models have been developed for ozone mass transfer and reaction kinetics. Mass transfer coefficient and chemical reaction rate constants were determined by using regression algorithm on a digital computer. The results have been verified by applying the experimental data with o-chlorophenol.
Recommended Citation
Khan, Shahab Rashid, "Design of a photoreactor for the oxidation of toxic pollutants in water by ozone and ultraviolet radiation" (1983). Theses. 3556.
https://digitalcommons.njit.edu/theses/3556
