Document Type
Thesis
Date of Award
8-31-1988
Degree Name
Master of Science in Chemical Engineering - (M.S.)
Department
Chemical Engineering, Chemistry and Environmental Science
First Advisor
Ching-Rong Huang
Second Advisor
George Y. Lei
Third Advisor
Chen-Chong Lin
Abstract
A new photoreactor was designed with stainless steel to oxidize refractory chemicals found on the EPA priority list. This new system was investigated by conducting experiments with three three model compounds, namely, toluene benzene and p-xylene. While toluene and benzene reactions are similar, they are faster with UV/ozone than UV/H2O2 and p-xylene reacts even faster with UV/ozone than UV/H2O2. The experimental data obtained were analyzed by GC and used to interpret the reaction kinetics from proposed models. The rate constants and mass transfer coefficients were found by using the Rosenbsrock Hillclimb optimization algorithm. Using these results gave the best fit to the experimental data.
Recommended Citation
Horng, Shiey-Shiun, "Oxidation of toluene, benzene and p-xylene in a photoreactor" (1988). Theses. 3103.
https://digitalcommons.njit.edu/theses/3103