"Design and simulation of submicron microelectronic vacuum triodes" by Hou-Jun Wang

Document Type

Thesis

Date of Award

9-30-1990

Degree Name

Master of Science in Electrical Engineering - (M.S.)

Department

Electrical and Computer Engineering

First Advisor

William N. Carr

Second Advisor

Ken K. Chin

Third Advisor

Edip Niver

Abstract

This thesis presents the first design and detailed Simulation of submicron vacuum microelectronic triodes static characteristics. In this thesis a new 5-electrode active device is emphasized.

These devices have potentially important advantages over semiconductor devices. They can be used in extreme environments. The picosecond transit time for internal electron ballistics provide optimism for very fast devices applications. It appears reasonable to fabricate these devices using standard VLSI processing equipment. Further, the micron dimension makes " vacuum microelectronic chips" a reasonable goal.

Devices are characterized for static parameters including electron trajectories, electric field contours, and voltage potential contours. The field emission current from cold cathodes is modelled using Fowler Nordheim theory for tunneling surfaces. Total current flow and tubes of current are obtained by integrating electron source densities over the surface of the cathode. The simulator uses an available program SIMION which has been modified by the author.

Lateral triode devices with a one micron cathode-grid spacing provide a transconductance of approx. 1 mS at 1 ma. Using supply potentials of 50 to 100 volts it appears reasonable to obtain transconductance of 1 mS using a cathode wedge tip radius of a 10 to 20 nm.

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