Document Type
Thesis
Date of Award
Spring 5-31-1993
Degree Name
Master of Science in Electrical Engineering - (M.S.)
Department
Electrical and Computer Engineering
First Advisor
William N. Carr
Second Advisor
Durgamadhab Misra
Third Advisor
N. M. Ravindra
Fourth Advisor
Michael J. Grieco
Abstract
Tantalum silicide was studied as an alternative microelectromechanical material by fabricating a rotary micromotor utilizing a proven design. This material was used for the rotor, stators, and bearing over a silicon substrate. It has the attraction of potentially reducing the friction which is a major problem with polysilicon-to-polysilicon bearings.
The necessity of high aspect ratio features required that a plasma or reactive ion etch with a high degree of anisotropy be developed to etch tantalum silicide films in excess of 1.5μm. A sulfur hexafluoride/Freon 115 plasma provided the necessary process control during the etches. The stress present in annealed tantalum silicide films made it necessary to limit the maximum processing temperature to 300°C. These low temperature tantalum silicide films have thus far proved to be inadequate as a microelectromechanical material for the micromotor due to their inability to withstand the hydrofluoric acid release etch.
Recommended Citation
Berry, Michael Steven, "Tantalum silicide variable capacitance rotary micromotors : design and fabrication" (1993). Theses. 1266.
https://digitalcommons.njit.edu/theses/1266
