Fabrication of integrated optic sensor to monitor pollutant concentration in effluents

Author

Kiran Chatty, New Jersey Institute of Technology

Document Type

Thesis

Date of Award

Fall 10-31-1996

Degree Name

Master of Science in Engineering Science- (M.S.)

Department

Committee for the Interdisciplinary Program in Materials Science and Engineering

First Advisor

Roland A. Levy

Second Advisor

Lev N. Krasnoperov

Third Advisor

John Francis Federici

Abstract

An attempt has been made to fabricate an integrated optic sensor to monitor pollutant concentration in effluents. Optic fiber has to be coupled to the waveguide in order to send light through the waveguide. In order to facilitate the easy coupling of the fiber to the waveguide, V-grooves were formed in the silicon substrate. In order to achieve this Silicon nitride was deposited to serve as an etch mask. An attempt was made to obtain low stress silicon nitride films.

This work also attempted to synthesize the materials required to fabricate the waveguide. LPCVD processes were developed to produce undoped and Phosphorus doped SiO₂, films. Undoped SiO₂ is used as a cladding material for waveguide. The Phosphorus doped SiO₂ (PSG) is the core material of the waveguide. Diethylsilane (DES) was used as a precursor for the deposition of the undoped oxide and Trimethylphosphite (IMP) was used as the Phosphorus source for the deposition of the PSG films. Conditions for dry etching of SiO₂ and PSG was developed.

Recommended Citation

Chatty, Kiran, "Fabrication of integrated optic sensor to monitor pollutant concentration in effluents" (1996). Theses. 1085.
https://digitalcommons.njit.edu/theses/1085