Synthesis and characterization of band gap-reduced ZnO:N and ZnO:(Al,N) films for photoelectrochemical water splitting
Document Type
Article
Publication Date
1-1-2010
Abstract
ZnO thin films with significantly reduced band gaps were synthesized by doping N and codoping Al and N at 100 °C. All the films were synthesized by radiofrequency magnetron sputtering on F-doped tin-oxide-coated glass. We found that codoped ZnO: (Al,N) thin films exhibited significantly enhanced crystallinity compared with ZnO doped solely with N, ZnO:N, at the same growth conditions. Furthermore, annealed ZnO:(Al,N) thin films exhibited enhanced N incorporation over ZnO:N films. As a result, ZnO:(Al,N) films exhibited better photocurrents than ZnO:N films grown with pure N doping, suggesting that charge-compensated donor-acceptor codoping could be a potential method for band gap reduction of wide-band gap oxide materials to improve their photoelectrochemical performance. © 2010 Materials Research Society.
Identifier
77953128716 (Scopus)
Publication Title
Journal of Materials Research
External Full Text Location
https://doi.org/10.1557/jmr.2010.0017
ISSN
08842914
First Page
69
Last Page
75
Issue
1
Volume
25
Fund Ref
U.S. Department of Energy
Recommended Citation
Shet, Sudhakar; Ahn, Kwang Soon; Deutsch, Todd; Wang, He Ii; Ravindra, Nuggehalli; Yan, Yanfa; Turner, John; and Al-Jassim, Mowafak, "Synthesis and characterization of band gap-reduced ZnO:N and ZnO:(Al,N) films for photoelectrochemical water splitting" (2010). Faculty Publications. 6527.
https://digitalcommons.njit.edu/fac_pubs/6527
