Synthesis and characterization of bandgap-reduced p-type cu-incorporated ZnO films
Document Type
Conference Proceeding
Publication Date
12-1-2008
Abstract
Cu-doped ZnO thin films with significantly reduced bandgaps were synthesized by incorporation of Cu at room temperature and followed by post-deposition annealing at 500°C in air for 2 hours. All the films were synthesized by RF magnetron sputtering in O2 gas ambient on F-doped tin oxide-coated glass. We found that annealing at 600°C, unlike at 500°C, caused the formation of the CuO phase in the ZnO:Cu films. Optical absorption indicated that some of the Cu in as- grown ZnO:Cu films is metallic. It can be converted into Cu+1 acceptor states by post-deposition annealing at 500°C in air. Mott-Schottky plots, open-circuit response to illumination, and illuminated current-voltage curves along with optical-absorption measurements revealed that ZnO:Cu thin films with p-type conductivity and significantly reduced bandgap were successfully synthesized by Cu incorporation. © 2008 M5&T'08 ®.
Identifier
63749123898 (Scopus)
ISBN
[9781605606217]
Publication Title
Materials Science and Technology Conference and Exhibition MS and T 08
First Page
901
Last Page
913
Volume
2
Recommended Citation
Ahn, Kwang Soon; Shet, Sudhakar; Deutsch, Todd; Yan, Yanfa; Turner, John; Ravindra, N. M.; and Al-Jassim, M., "Synthesis and characterization of bandgap-reduced p-type cu-incorporated ZnO films" (2008). Faculty Publications. 12431.
https://digitalcommons.njit.edu/fac_pubs/12431
