Petri net-based scheduling of single-arm cluster tools with reentrant atomic layer deposition processes
Document Type
Article
Publication Date
1-1-2011
Abstract
For some wafer fabrication processes in cluster tools, e.g., atomic layer deposition (ALD), wafer revisiting is required. Typically, in such processes, wafers need to visit two consecutive processing steps several times. Such a revisiting process can be denoted as (mi, mi+1 h, where i means the ith-step and mi and mi+1 mean the corresponding quantity of the processing modules in i and (i+1)th steps, and h the number of visiting times. This paper conducts a study for scheduling single-arm cluster tools with such a wafer revisiting process. The system is modeled by Petri nets (PNs) to guarantee the feasibility of robot activities. Based on the model, a deadlock avoidance policy is presented. With the control policy, cycle time analysis for the revisiting process is made. With the fact that wafer processing times are much longer than robot movement times in cluster tools, it is shown that, when mi = mi+1 = 1, i.e., each step has only one processing module, the optimal one-wafer cyclic schedule is deterministic and unique, and the minimal cycle time can be calculated by an analytical expression. It is also shown that, when m i = 1 and mi+1 = 2 or mi = 2 and m i+1 = 1, the optimal one-wafer cyclic schedule can be obtained by finding h deterministic schedules and the one with the least cycle time. A novel analytical method is finally presented to schedule the overall system containing such reentrant wafer flow. This represents a significant advance in single-arm cluster equipment automation. © 2010 IEEE.
Identifier
85027957575 (Scopus)
Publication Title
IEEE Transactions on Automation Science and Engineering
External Full Text Location
https://doi.org/10.1109/TASE.2010.2046736
ISSN
15455955
First Page
42
Last Page
55
Issue
1
Volume
8
Recommended Citation
Wu, Naiqi; Chu, Feng; Chu, Chengbin; and Zhou, Mengchu, "Petri net-based scheduling of single-arm cluster tools with reentrant atomic layer deposition processes" (2011). Faculty Publications. 11652.
https://digitalcommons.njit.edu/fac_pubs/11652
