Document Type


Date of Award


Degree Name

Master of Science in Electrical Engineering - (M.S.)


Electrical Engineering

First Advisor

Walter F. Kosonocky

Second Advisor

Durgamadhab Misra

Third Advisor

N. M. Ravindra


Multi-Wavelength Imaging Pyrometry (M-WIP) measures thermal radiation of any target (color or gray) in multiple narrow-spectral-regions and can simultaneously determine target temperature and emissivity. One approach for measuring radiation at multiple wavelengths using a 320X244 element Pt-Si SBD infrared camera is to use narrow-band striped filters deposited on a transparent substrate with proper alignment. The major focus of this thesis was the design of a four layer mask for investigating the feasibility of defining three-wavelength striped filters compatible with focal plane array. This mask design allows twelve distinct narrow band striped filter geometries and four test-patterns on a 4-inch silicon wafer.

Prior knowledge of spectral and directional emissivity as a function of thickness of the layer being etched or deposited has extreme importance in improving operating parameters of M-WIP such as selection of spectral range and number of required wavelength. A detailed study of spectral (2.5 µm to 5.0 µm) and directional (0° and 80° from the normal of surface) emissivity variation of thin-film multilayer structure was done, using the developed model, for several important structures commonly used in plasma etching. These multi-layer structures are Poly-Si on thin and thick oxides, silicides on thick oxides and polysides on thin oxides. This analysis can be easily extended to other processing techniques such as sputtering, evaporation, CVD and RTP.