Document Type

Thesis

Date of Award

10-31-1993

Degree Name

Master of Science in Electrical Engineering - (M.S.)

Department

Electrical Engineering

First Advisor

Walter F. Kosonocky

Second Advisor

Durgamadhab Misra

Third Advisor

N. M. Ravindra

Abstract

Multi-Wavelength Imaging Pyrometry (M-WIP) measures thermal radiation of any target (color or gray) in multiple narrow-spectral-regions and can simultaneously determine target temperature and emissivity. One approach for measuring radiation at multiple wavelengths using a 320X244 element Pt-Si SBD infrared camera is to use narrow-band striped filters deposited on a transparent substrate with proper alignment. The major focus of this thesis was the design of a four layer mask for investigating the feasibility of defining three-wavelength striped filters compatible with focal plane array. This mask design allows twelve distinct narrow band striped filter geometries and four test-patterns on a 4-inch silicon wafer.

Prior knowledge of spectral and directional emissivity as a function of thickness of the layer being etched or deposited has extreme importance in improving operating parameters of M-WIP such as selection of spectral range and number of required wavelength. A detailed study of spectral (2.5 µm to 5.0 µm) and directional (0° and 80° from the normal of surface) emissivity variation of thin-film multilayer structure was done, using the developed model, for several important structures commonly used in plasma etching. These multi-layer structures are Poly-Si on thin and thick oxides, silicides on thick oxides and polysides on thin oxides. This analysis can be easily extended to other processing techniques such as sputtering, evaporation, CVD and RTP.

Share

COinS