Document Type
Thesis
Date of Award
10-31-1993
Degree Name
Master of Science in Electrical Engineering - (M.S.)
Department
Electrical Engineering
First Advisor
Walter F. Kosonocky
Second Advisor
Durgamadhab Misra
Third Advisor
N. M. Ravindra
Abstract
Multi-Wavelength Imaging Pyrometry (M-WIP) measures thermal radiation of any target (color or gray) in multiple narrow-spectral-regions and can simultaneously determine target temperature and emissivity. One approach for measuring radiation at multiple wavelengths using a 320X244 element Pt-Si SBD infrared camera is to use narrow-band striped filters deposited on a transparent substrate with proper alignment. The major focus of this thesis was the design of a four layer mask for investigating the feasibility of defining three-wavelength striped filters compatible with focal plane array. This mask design allows twelve distinct narrow band striped filter geometries and four test-patterns on a 4-inch silicon wafer.
Prior knowledge of spectral and directional emissivity as a function of thickness of the layer being etched or deposited has extreme importance in improving operating parameters of M-WIP such as selection of spectral range and number of required wavelength. A detailed study of spectral (2.5 µm to 5.0 µm) and directional (0° and 80° from the normal of surface) emissivity variation of thin-film multilayer structure was done, using the developed model, for several important structures commonly used in plasma etching. These multi-layer structures are Poly-Si on thin and thick oxides, silicides on thick oxides and polysides on thin oxides. This analysis can be easily extended to other processing techniques such as sputtering, evaporation, CVD and RTP.
Recommended Citation
Shah, Jitesh Navinchandra, "Design of mask for striped filters and thin-film multi-layer emissivity modeling for multi-wavelength imaging pyrometer" (1993). Theses. 1909.
https://digitalcommons.njit.edu/theses/1909
