"Effect of Current Density Ramping on the Growth Rate and Structure of " by Peter Totaro and Boris Khusid
 

Effect of Current Density Ramping on the Growth Rate and Structure of AA2024-T3

Document Type

Article

Publication Date

5-1-2022

Abstract

The presented study successfully demonstrated advantages of multistep anodization of AA2024—T3. Coating properties and morphology were studied in detail for five anodization pro-cesses: a conventional Base process with a constant applied current density and processes with current density applied in one (OS1 and OS2) and five (MS1 and MS2) steps at different magnitudes during the ramp period. Due to lower oxygen infusion, processes MS1 and MS2 produced a more intact coating with reduced porosity and enhanced abrasion resistance and hardness. The presented results clearly demonstrate that starting anodization at a low voltage and then slowly ramping current density will form coatings with a higher aluminum/oxygen ratio and enhanced properties over a shorter period of processing.

Identifier

85129954703 (Scopus)

Publication Title

Materials

External Full Text Location

https://doi.org/10.3390/ma15093258

e-ISSN

19961944

Issue

9

Volume

15

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