Nonlinear optical properties of laser ablated silicon nanostructures

Document Type

Article

Publication Date

9-1-2002

Abstract

The role of crystallite symmetry on the nonlinear optical properties of laser ablated silicon films is discussed in this article. Laser ablated Si films exhibit a nonlinear refractive index change which may be as high as Δn=-0.5 at wavelength of λ=532 nm for films with an average thickness of 200 nm. However, the origin of this nonlinearity is not known. These films consist of large droplets comprised of hexagonal wurtzite symmetry crystallites and nanoclusters interspersed between them. Using Raman spectroscopy and linear and nonlinear optical measurements, we monitored the crystallographic symmetry of these droplets when annealed under various conditions. Based on the results we attribute the large nonlinear refraction coefficient to the hexagonal wurtzite symmetry of the crystallites, hence raising the possibility for developing very efficient nonlinear optical devices. © 2002 American Institute of Physics. © 2002 American Institute of Physics.

Identifier

0036733850 (Scopus)

Publication Title

Journal of Applied Physics

External Full Text Location

https://doi.org/10.1063/1.1498881

ISSN

00218979

First Page

2490

Last Page

2494

Issue

5

Volume

92

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