Microbeam high angular resolution diffraction applied to optoelectronic devices

Document Type

Conference Proceeding

Publication Date

3-26-2007

Abstract

Collimating perfect crystal optics in a combination with the X-ray focusing optics has been applied to perform high angular resolution microbeam diffraction and scattering experiments on micron-size optoelectronic devices produced by modern semiconductor technology. At CHESS, we used capillary optics and perfect Si/Ge crystal(s) arrangement to perform X-ray standing waves, high angular-resolution diffraction and high resolution reciprocal space mapping analysis. At the APS, 2ID-D microscope beamline, we employed a phase zone plate producing a beam with the size of 240 nm in the horizontal plane and 350 nm in the vertical (diffraction) plane and a perfect Si (004) analyzer crystal to perform diffraction analysis of selectively grown InGaAsP and InGaAlAs-based waveguides with arc sec angular resolution. © 2007 American Institute of Physics.

Identifier

33947397097 (Scopus)

ISBN

[0735403732, 9780735403734]

Publication Title

Aip Conference Proceedings

External Full Text Location

https://doi.org/10.1063/1.2436325

e-ISSN

15517616

ISSN

0094243X

First Page

1395

Last Page

1398

Volume

879

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