Deep X-ray lithography in the fabrication process of a 3D diffractive optical element

Authors

S. P. Heussler, National University of Singapore
H. O. Moser, National University of Singapore
C. G. Quan, National University of Singapore
C. J. Tay, National University of Singapore
K. D. Moeller, Newark College of Engineering
M. Bahou, National University of Singapore
L. K. Jian, National University of Singapore

Document Type

Conference Proceeding

Publication Date

3-26-2007

Abstract

We present first results of the fabrication process of a diffractive optical element (DOE) using deep X-ray lithography. The DOE forms the core of our proposed fast parallel-processing infrared Fourier transform interferometer (FPP FTIR) that works without moving parts and may allow instantaneous spectral analysis only limited by detector bandwidth. Design and specifications of the DOE are discussed. A fabrication process including deep X-ray lithography (DXRL) on stepped substrates is introduced. © 2007 American Institute of Physics.

Identifier

33947379505 (Scopus)

ISBN

[0735403732, 9780735403734]

Publication Title

Aip Conference Proceedings

External Full Text Location

https://doi.org/10.1063/1.2436350

e-ISSN

15517616

ISSN

0094243X

First Page

1503

Last Page

1506

Volume

879

Recommended Citation

Heussler, S. P.; Moser, H. O.; Quan, C. G.; Tay, C. J.; Moeller, K. D.; Bahou, M.; and Jian, L. K., "Deep X-ray lithography in the fabrication process of a 3D diffractive optical element" (2007). Faculty Publications. 13492.
https://digitalcommons.njit.edu/fac_pubs/13492