Carrier concentration tuning of bandgap-reduced p -type ZnO films by codoping of Cu and Ga for improving photoelectrochemical response
Document Type
Article
Publication Date
4-21-2008
Abstract
In this study, the synthesis of p -type ZnO films with similar bandgaps but varying carrier concentrations through codoping of Cu and Ga is reported. The ZnO:(Cu,Ga) films are synthesized by rf magnetron sputtering in O2 gas ambient at room temperature, followed by postdeposition annealing at 500 °C in air for 2 h. The bandgap reduction and p -type conductivity are caused by the incorporation of Cu. The tuning of carrier concentration is realized by varying the Ga concentration. The carrier concentration tuning does not significantly change the bandgap and crystallinity. However, it can optimize the carrier concentration to significantly enhance the photoelectrochemical response for bandgap-reduced p -type ZnO thin films. © 2008 American Institute of Physics.
Identifier
42149105029 (Scopus)
Publication Title
Journal of Applied Physics
External Full Text Location
https://doi.org/10.1063/1.2888578
ISSN
00218979
Issue
7
Volume
103
Fund Ref
U.S. Department of Energy
Recommended Citation
Shet, Sudhakar; Ahn, Kwang Soon; Yan, Yanfa; Deutsch, Todd; Chrustowski, Kevin M.; Turner, John; Al-Jassim, Mowafak; and Ravindra, Nuggehalli, "Carrier concentration tuning of bandgap-reduced p -type ZnO films by codoping of Cu and Ga for improving photoelectrochemical response" (2008). Faculty Publications. 12826.
https://digitalcommons.njit.edu/fac_pubs/12826
