Inhibition and promotion of copper corrosion by CTAB in a microreactor system

Document Type

Article

Publication Date

12-16-2008

Abstract

We report on an optical microscopy technique for the analysis of corrosion kinetics of metal thin films in microreactor systems and use it to study the role of cetyltrimethylammonium bromide surfactant as a corrosion inhibitor in a copper-gold galvanic coplanar microsystem. A minimum in the dissolution rate of copper is observed when the surfactant concentration is ∼0.8 mM. To explain why the inhibitory role of the surfactant does not extend to higher concentrations, we use zero resistance ammetry with separated half cells and show that while the surfactant inhibits cathodic reactions on gold, it also promotes the corrosion of copper because of the catalytic action of bromide counterions. These two competing processes lead to the observed minimum in the dissolution rate. © 2008 American Chemical Society.

Identifier

61849183558 (Scopus)

Publication Title

Langmuir

External Full Text Location

https://doi.org/10.1021/la8024759

ISSN

07437463

PubMed ID

19053648

First Page

14269

Last Page

14275

Issue

24

Volume

24

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