Photoluminescence and Raman scattering in axial Si/Ge nanowire heterojunctions
Document Type
Article
Publication Date
10-12-2009
Abstract
In crystalline, dislocation-free, Si/Ge nanowire axial heterojunctions grown using the vapor-liquid-solid technique, photoluminescence and Raman spectroscopy reveal a SiGe alloy transition layer with preferential chemical composition and strain. In addition to the lattice mismatch, strain in Si/Ge nanowires is observed from a temperature dependent study to be affected by the difference in Si and Ge thermal expansion. The conclusions are supported by analytical transmission electron microscopy measurements. © 2009 American Institute of Physics.
Identifier
70349665210 (Scopus)
Publication Title
Applied Physics Letters
External Full Text Location
https://doi.org/10.1063/1.3240595
ISSN
00036951
Issue
13
Volume
95
Grant
W911F-09–1–01–89
Fund Ref
National Science Foundation
Recommended Citation
Chang, H. Y.; Tsybeskov, L.; Sharma, S.; Kamins, T. I.; Wu, X.; and Lockwood, D. J., "Photoluminescence and Raman scattering in axial Si/Ge nanowire heterojunctions" (2009). Faculty Publications. 11919.
https://digitalcommons.njit.edu/fac_pubs/11919
