Atomic Layer Deposition and Atomic Layer Etching—An Overview of Selective Processes

Document Type

Conference Proceeding

Publication Date

1-1-2021

Abstract

The continued evolution in nanoelectronics and nanophotonics has been made possible by the recent developments in Atomic Layer Deposition and Atomic Layer Etching. While uniform deposition of conformal films with controllable thickness is a key feature of Atomic Layer Deposition, Atomic Layer Etching offers the advantages of controlled removal of chemically modified areas. Various case studies of the applications of these technologies in dielectrics, metals and diffusion barriers will be discussed.

Identifier

85104472595 (Scopus)

ISBN

[9783030652609]

Publication Title

Minerals Metals and Materials Series

External Full Text Location

https://doi.org/10.1007/978-3-030-65261-6_20

e-ISSN

23671696

ISSN

23671181

First Page

219

Last Page

229

Volume

5

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