Characterization of Switching Properties in ReRAM Devices by the Capacitance of the MIM Structure
Document Type
Article
Publication Date
8-1-2024
Abstract
In this article, an analysis of the switching mechanism in Resistive Random-Access-Memory devices in relation to the capacitance variation of the Metal-Insulator-Metal structure is performed through experimental capacitance measurements. A variation in the capacitance was observed when a set of pulses with different widths and amplitudes was applied to the devices in the Multi-Level-Cell regime. The presence of multiple resistive states can also be observed with the changes in the dielectric constant of the material’s insulating layer. The migration of the defects inside dielectric is responsible for the devices exhibiting multiple capacitive reactance states, demonstrating the conductance quantization, required for the application in in-memory computing systems.
Identifier
85201834149 (Scopus)
Publication Title
Journal of Integrated Circuits and Systems
External Full Text Location
https://doi.org/10.29292/jics.v19i2.805
e-ISSN
18720234
ISSN
18071953
Issue
2
Volume
19
Grant
303938/2020-0
Fund Ref
Coordenação de Aperfeiçoamento de Pessoal de Nível Superior
Recommended Citation
Costa, Fernando J.; Zeinati, Aseel; Trevisoli, Renan; Misra, D.; and Doria, Rodrigo T., "Characterization of Switching Properties in ReRAM Devices by the Capacitance of the MIM Structure" (2024). Faculty Publications. 243.
https://digitalcommons.njit.edu/fac_pubs/243