Effects of seeding methods on the fabrication of microcrystalline silicon solar cells using radio frequency plasma enhanced chemical vapor deposition

Document Type

Article

Publication Date

7-1-2005

Abstract

Single junction p-i-n μc-Si:H solar cells were prepared in a low-cost, large-area single chamber radio frequency plasma enhanced chemical vapor deposition system. The effects of seeding processes on the growth of μc-Si:H i-layers and performance of μc-Si:H solar cells were investigated. Seeding processes, usually featured by highly hydrogen rich plasma, are effective in inducing the growth of μc-Si:H i-layers. It has been demonstrated that p-layer seeding methods are preferable to i-layer seeding. While performance of μc-Si:H solar cells produced by i-layer seeding methods was usually limited by very low fill factors, μc-Si:H solar cells with good initial and stabilized conversion efficiencies were obtained by p-layer seeding. © 2005 Elsevier B.V. All rights reserved.

Identifier

18844435138 (Scopus)

Publication Title

Thin Solid Films

External Full Text Location

https://doi.org/10.1016/j.tsf.2004.12.029

ISSN

00406090

First Page

84

Last Page

88

Issue

1-2

Volume

483

Grant

-FG02-00ER45806

Fund Ref

U.S. Department of Energy

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