Trapping in deep defects under substrate hot electron stress in TiN/Hf-silicate based gate stacks
Document Type
Conference Proceeding
Publication Date
12-1-2005
Identifier
33847218273 (Scopus)
ISBN
[1424400848, 9781424400843]
Publication Title
2005 International Semiconductor Device Research Symposium
First Page
213
Last Page
214
Volume
2005
Grant
-0140584
Fund Ref
National Science Foundation
Recommended Citation
Chowdhury, N. A.; Srinivasan, P.; and Misra, D., "Trapping in deep defects under substrate hot electron stress in TiN/Hf-silicate based gate stacks" (2005). Faculty Publications. 19378.
https://digitalcommons.njit.edu/fac_pubs/19378
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