Photoluminescence fatigue in three-dimensional silicon/silicon-germanium nanostructures
Document Type
Article
Publication Date
3-15-2012
Abstract
We find fatigue of low temperature photoluminescence (PL) in Si/SiGe three-dimensional island morphology nanostructures under continuous excitation. Initially, the PL intensity slowly decreases by less than 15, and after ∼10 min it decreases rapidly by more than 80. After the PL intensity stabilizes, a complete recovery requires heating the sample to nearly room temperature. We propose that accumulation of charge within SiGe islands is responsible for the enhancement of Auger recombination and hence the observed PL fatigue. © 2012 American Institute of Physics.
Identifier
84859524829 (Scopus)
Publication Title
Journal of Applied Physics
External Full Text Location
https://doi.org/10.1063/1.3698303
ISSN
00218979
Issue
6
Volume
111
Grant
1005682
Fund Ref
National Science Foundation
Recommended Citation
Modi, N.; Tsybeskov, L.; Baribeau, J. M.; Wu, X.; and Lockwood, D. J., "Photoluminescence fatigue in three-dimensional silicon/silicon-germanium nanostructures" (2012). Faculty Publications. 18319.
https://digitalcommons.njit.edu/fac_pubs/18319
