Excitation wavelength dependent photoluminescence in structurally non-uniform Si/SiGe-island heteroepitxial multilayers
Document Type
Conference Proceeding
Publication Date
6-1-2012
Abstract
In nanometer-size Si/SiGe-island heteroepitxial multilayers grown on Si(001), low temperature photoluminescence spectra are observed that strongly depend on the excitation wavelength and show a strong correlation with structural properties revealed by transmission electron microscopy. These experimental results can be explained by assuming that the optically created carriers are strongly localized at Si/SiGe island heterointerfaces. We show that electron-hole pairs are generated and recombine within spatial regions mainly defined by the photoexcitation penetration depth, and that the estimated exciton diffusion length is notably short and comparable with the SiGe-island average size. © 2012 American Institute of Physics.
Identifier
84863307200 (Scopus)
Publication Title
Journal of Applied Physics
External Full Text Location
https://doi.org/10.1063/1.4729077
ISSN
00218979
Issue
11
Volume
111
Fund Ref
National Science Foundation
Recommended Citation
Modi, N.; Lockwood, D. J.; Wu, X.; Baribeau, J. M.; and Tsybeskov, L., "Excitation wavelength dependent photoluminescence in structurally non-uniform Si/SiGe-island heteroepitxial multilayers" (2012). Faculty Publications. 18240.
https://digitalcommons.njit.edu/fac_pubs/18240
