Field emitter tips for vacuum microelectronic devices
Document Type
Article
Publication Date
1-1-1990
Abstract
The design criteria for two forms of field emitters (cone and wedge) for vacuum microelectronic applications are discussed. Effects of practical variations in geometry on emission current, spatial and temporal dispersion of electron emission, and emitter heating are calculated by simulation. Several design guidelines for the geometry of the emitter-anode complex are suggested. A sharp silicon tip processing method is presented, which is based on the oxidation inhibition of silicon at regions of high curvature. Methods for forming emitters of other materials are also discussed. © 1990, American Vacuum Society. All rights reserved.
Identifier
0005530772 (Scopus)
Publication Title
Journal of Vacuum Science and Technology A Vacuum Surfaces and Films
External Full Text Location
https://doi.org/10.1116/1.576511
e-ISSN
15208559
ISSN
07342101
First Page
3586
Last Page
3590
Issue
4
Volume
8
Recommended Citation
Chin, K. Ken, "Field emitter tips for vacuum microelectronic devices" (1990). Faculty Publications. 17789.
https://digitalcommons.njit.edu/fac_pubs/17789
