The effect of nonlinear ion transport on the rate of laser-induced electrochemical etching of semiconductors

Document Type

Article

Publication Date

12-1-1990

Abstract

Based on a nonlinear coupling between the etchant species and the photo-induced carriers during photoelectrochemical etching of semiconductor surfaces, we propose that an optimum exists for the reaction rate as a function of electrolyte concentration.

Identifier

0042219749 (Scopus)

Publication Title

Journal of Applied Physics

External Full Text Location

https://doi.org/10.1063/1.345571

ISSN

00218979

First Page

1947

Last Page

1949

Issue

4

Volume

67

Grant

0844448

Fund Ref

National Science Foundation

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