Endoradiosonde pressure sensor system for chronic biomedical monitoring

Document Type

Conference Proceeding

Publication Date

12-1-1990

Abstract

The development of totally implantable microsensors for biomedical applications, including chronic intracranial monitoring, is reviewed. The design and fabrication of an implantable silicon sensor based on microelectronics technology are described. In this implantable device intracranial pressure is sensed by a chemically etched silicon diaphragm absolute pressure gage. It uses double-metal films with a silicon substrate. Wafer processing uses standard VLSI technology with the exception of the microengineered sacrificial cavity material. A dielectric film is deposited between the two metal films and is sacrificed by wet chemical etching to provide the required cavity. It is concluded that semiconductor technology provides a viable solution for microdimensioned passive pressure sensors in bioengineering applications.

Identifier

0025539531 (Scopus)

ISBN

[0879425598]

Publication Title

Proceedings of the Annual Conference on Engineering in Medicine and Biology

ISSN

05891019

First Page

514

Last Page

515

Issue

pt 2

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