A method and apparatus for surface modification by gas-cluster ion impact

Document Type

Article

Publication Date

4-2-1993

Abstract

We report here a preliminary study of the effects of Ar cluster ions of relatively low energy (15 → 30 keV) on Si surfaces and on Au films deposited on Si. The cluster size distribution was measured by time of flight and retarding potential methods. The mean cluster size was varied between 150 and 600 atoms so that the mean energy per atom in a cluster was of the order of 100 eV. The irradiated samples were analyzed by RBS and channeling and their surfaces were examined with SEM. © 1993.

Identifier

0010877428 (Scopus)

Publication Title

Nuclear Inst and Methods in Physics Research B

External Full Text Location

https://doi.org/10.1016/0168-583X(93)95072-D

ISSN

0168583X

First Page

336

Last Page

340

Issue

1-2

Volume

74

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