Analytic solution of an LPCVD reactor interwafer region

Document Type

Article

Publication Date

4-15-1993

Abstract

A new approach to solving the non-linear system of partial differential equations governing the interwafer region of an LPCVD reactor is presented. This technique yields an analytic solution of the concentration profile. Use of this concentration profile in conjunction with elementary material balance procedures, reproduces published experimental deposition data. © 1993.

Identifier

0027577216 (Scopus)

Publication Title

Thin Solid Films

External Full Text Location

https://doi.org/10.1016/0040-6090(93)90199-Y

ISSN

00406090

First Page

15

Last Page

21

Issue

1

Volume

226

This document is currently not available here.

Share

COinS