Pulsed laser deposition of NASICON thin films for the fabrication of ion selective membranes

Authors

R. Izquierdo, Polytechnique Montréal
E. Quenneville, Polytechnique Montréal
D. Trigylidas, Polytechnique Montréal
F. Girard, Polytechnique Montréal
M. Meunier, Polytechnique Montréal
D. Ivanov, Polytechnique Montréal
M. Paleologou, Polytechnique Montréal
A. Yelon, Polytechnique Montréal

Document Type

Article

Publication Date

1-1-1997

Abstract

Pulsed laser deposition is used to deposit thin films of Na superionic conductor (NASICON). The resulting thin films are good ionic conductors with resistivites between 3 × 10³ and 5 × 10⁴ Ω cm at room temperature depending on the deposition conditions. By depositing these films on Raipore cation-selective membranes, composite membranes can be fabricated. The cumulative current effeciency of these membranes for the production of sodium hydroxide from sodium sulfate using electrolysis is improved by 23%. In addition, the composite membranes presented a higher resistance to fouling by multivalent cations than the polymeric membranes.

Identifier

0031373479 (Scopus)

Publication Title

Journal of the Electrochemical Society

External Full Text Location

https://doi.org/10.1149/1.1838147

ISSN

00134651

First Page

L323

Last Page

L325

Issue

12

Volume

144

Recommended Citation

Izquierdo, R.; Quenneville, E.; Trigylidas, D.; Girard, F.; Meunier, M.; Ivanov, D.; Paleologou, M.; and Yelon, A., "Pulsed laser deposition of NASICON thin films for the fabrication of ion selective membranes" (1997). Faculty Publications. 16928.
https://digitalcommons.njit.edu/fac_pubs/16928