Interactive system for wafer emissivity estimation as determined in an RTP chamber

Document Type

Conference Proceeding

Publication Date

1-1-1997

Abstract

We demonstrate an interactive software system in which the emissivity of wafers can be estimated in situ using different models. The system allows the data taker to introduce a choice of design parameters necessary for the control of temperature uniformity. The objective of the interactive system is to obtain a better estimation of the wavelength dependent emissivity by using existing data such as integrated emissivity, for example, as input information. Results for some of the models are presented and compared to show differences in the models chosen. The principle advantage offered by the system are the likely prospects of a realistic improvement and confident assessment for real time temperature measurement and control in an RTP environment.

Identifier

0031333965 (Scopus)

Publication Title

Materials Research Society Symposium Proceedings

External Full Text Location

https://doi.org/10.1557/proc-470-29

ISSN

02729172

First Page

29

Last Page

34

Volume

470

Grant

9312451

Fund Ref

National Science Foundation

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