Temperature estimation and precision control of RTP systems by multi-zone lamp interference and wafer emissivity compensation. I: Model identification

Document Type

Conference Proceeding

Publication Date

1-1-1997

Abstract

RTP temperature measurement using conventional pyrometric technique has serious limitations such as uncertainty of emissivity, lamp interference, and window/chamber heating effect. In this paper, we propose to compensate for these effects using a real-time computational algorithm based on physical model of pyrometric detectors and wafer temperature dynamics. We consider an RTP system for processing 200 mm wafers with five circular zones of heating lamps and ten pyrometric sensors, five of which measure the radiation from five optically isolated dummy lamps and the rest measure the radiation of the wafer back side at different radial positions. Thermocouple measurements are also used to identify the model parameters. Part I of the paper is concerned with modeling and parameter identification.

Identifier

0031378422 (Scopus)

Publication Title

Materials Research Society Symposium Proceedings

External Full Text Location

https://doi.org/10.1557/proc-470-91

ISSN

02729172

First Page

91

Last Page

96

Volume

470

Grant

9312451

Fund Ref

National Science Foundation

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