Nonlinear optical properties of silicon nanoclusters
Document Type
Conference Proceeding
Publication Date
12-1-1997
Abstract
The nonlinear optical properties of small nano-scale semiconducting silicon was investigated. Atomic force microscopy (AFM) was used to measure the size distribution of the clusters in three major size regions: Region I had the smallest size clusters in the range of 3-43 nm with a mean value at 7 nm and standard deviation of 3 nm; the `medium' clusters in Region II ranged between 5-42 nm with a mean value at 11 nm and standard deviation of 8 nm; and Region III has cluster size distribution from 15-85 nm with a mean value at 50 nm and standard deviation of 22 nm. The clusters of average size of 11 nm absorbed strongly at λ = 355 nm and possessed Re{χ(3)}>0 whereas clusters of all sizes adsorbed strongly at λ = 532 nm and exhibited Re{χ(3)}<0.
Identifier
0031358633 (Scopus)
Publication Title
Conference Proceedings Lasers and Electro Optics Society Annual Meeting LEOS
ISSN
10928081
First Page
113
Last Page
114
Volume
2
Recommended Citation
Vijayalakshmi, S.; Shen, F.; and Grebel, H., "Nonlinear optical properties of silicon nanoclusters" (1997). Faculty Publications. 16641.
https://digitalcommons.njit.edu/fac_pubs/16641
