Nonlinear optical properties of silicon nanoclusters made by laser ablation
Document Type
Conference Proceeding
Publication Date
1-1-1998
Abstract
The nonlinear optical properties of the laser ablated silicon nanoclustered films were measured by Z-scan measurements. Measurements that was carried out with a 10-ns, frequency doubled, Q-switched Nd:YAG laser indicated that β(I0 = 3×104 W/cm2)≈0. The films showed a large nonlinear diffraction effect and underwent bleaching. To eliminate any nonlinear and to assess the time scales of this phenomena, the nonlinear absorption of laser ablated films were measured at different repetition rates. Combination of lowered repetition rates and ultrashort pulses allowed the access intensities several orders of magnitude higher than that obtained with nanosecond excitation and avoid thermal contributions to the nonlinearity.
Identifier
0031676191 (Scopus)
Publication Title
Technical Digest European Quantum Electronics Conference
First Page
88
Last Page
89
Recommended Citation
Lalanne, E.; Garcia, H.; Johnson, A. M.; Vijayalakshmi, S.; and Grebel, H., "Nonlinear optical properties of silicon nanoclusters made by laser ablation" (1998). Faculty Publications. 16388.
https://digitalcommons.njit.edu/fac_pubs/16388
