Silicon microlenses for IR image sensors

Document Type

Conference Proceeding

Publication Date

12-1-1998

Abstract

We report a comprehensive approach to design, fabricate and characterize silicon microlenses for applications in IR image sensors. ZEMAX design tool was used to assist in the design of the lenses. Conventional photolithography and thermal reflow of melting resist technique were deployed to achieve spherical resists patterns. Reactive ion etching (RIE) was utilized for transfer of resist patterns to the substrate in O2 and C2F6 environment. The shape of the fabricated lenses, i.e. radii of curvature and focal length were controlled within a wide range, by controlling the etch rates of resist and substrate, which were further controlled by varying the flow of gases, selectivity and power. Optical methods such as ray analysis and profilometry were used to obtain lens properties. Scanning electron microscopy was performed to analyze the morphology of the fabricated lenses.

Identifier

0037660485 (Scopus)

Publication Title

Proceedings of SPIE the International Society for Optical Engineering

External Full Text Location

https://doi.org/10.1117/12.324293

ISSN

0277786X

First Page

152

Last Page

161

Volume

3511

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