Characterization of laser ablated silicon thin films

Document Type

Article

Publication Date

1-1-1999

Abstract

Using laser ablation, we deposited silicon layers consisting of clusters and crystalline domains onto glass, quartz, aluminum, titanium, copper, single-crystal silicon and single-crystal potassium bromide substrates. The microstructure and the morphology of the films were characterized by use of optical microscopy, laser scanning microscopy, atomic force microscopy, transmission electron microscopy, micro-Raman spectroscopy, X-ray photoelectron spectroscopy and X-ray diffraction. The results indicated that the deposited material was composed of microcrystalline droplets, typically 3.5 μm in diameter, separated by amorphous-like regions. The droplets were composed of crystalline material at their centers and an outer halo of nanometer-size particles. © 1999 Elsevier Science S.A. All rights reserved.

Identifier

0033534965 (Scopus)

Publication Title

Thin Solid Films

External Full Text Location

https://doi.org/10.1016/S0040-6090(98)01158-4

ISSN

00406090

First Page

102

Last Page

108

Issue

1-2

Volume

339

This document is currently not available here.

Share

COinS