Modeling and simulation for epitaxial growth with strain
Document Type
Conference Proceeding
Publication Date
12-1-2003
Abstract
Strain has significance for both the growth characteristics and material properties of thin epitaxial films. In this work, the method of lattice statics is applied to an epitaxial system with cubic symmetry, using linear elasticity. The energy density and force balance equations are written using a finite difference formalism that clearly shows their consistency with continuum elasticity. For simplicity, the atomic interactions are assumed to be maximally localized. For a layered material system with a material/vacuum interface and with surface steps, force balance equations are derived, and intrinsic surface stress at the material/vacuum interface is included by treating the atoms at the surface as belonging to a different material. By defining the strain relative to an appropriately chosen nonequilibrium lattice, as in the method of eigenstrains, analytic formulas in terms of microscopic parameters are found for the macroscopic monopole and dipole forces due to a step.
Identifier
6344276778 (Scopus)
ISBN
[0972842209, 9780972842204]
Publication Title
2003 Nanotechnology Conference and Trade Show Nanotech 2003
First Page
37
Last Page
38
Volume
3
Recommended Citation
Caflisch, R. E.; Connell, C.; Luo, E.; Gyure, M.; Simms, G.; and Vvedensky, D., "Modeling and simulation for epitaxial growth with strain" (2003). Faculty Publications. 13895.
https://digitalcommons.njit.edu/fac_pubs/13895
