Microfabricated implantable pressure sensor for flow measurement

Document Type

Conference Proceeding

Publication Date

3-31-2008

Abstract

A RF wireless capacitive pressure sensor is developed. The sensor has integrated inductor with the pressure sensitive capacitor as LC circuit. The resonant frequency of the sensor changes as the capacitance changes with applied pressure. The sensor uses LPCVD silicon nitride as sensitive membrane and the residual stress of the membrane has been measure as 139MPa. The sensor has size of 10 mm × 4 mm ×0.5 um. The sensor presents a pressure sensitivity of 1.65 MHz/cmH2O in pressure range of 0-20 CmH2O. The deflection of different shape of membranes is discussed. The deflection of square membrane is 130% to circular membrane under same applied pressure.

Identifier

41149085997 (Scopus)

ISBN

[9780819470591]

Publication Title

Proceedings of SPIE the International Society for Optical Engineering

External Full Text Location

https://doi.org/10.1117/12.763740

ISSN

0277786X

Volume

6884

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