Intrafacet migration effects in InGaN/GaN structures grown on triangular GaN ridges studied by submicron beam x-ray diffraction
Document Type
Article
Publication Date
4-3-2008
Abstract
Synchrotron radiation has been utilized for x-ray diffraction and reciprocal space mapping of InGaNGaN multiple-quantum-well (MQW) structures grown on the sidewalls of 10-μm -wide triangular GaN ridges with {1-1.1} facets. Samples were produced by lateral overgrowth through a patterned dielectric mask by using metal-organic vapor-phase epitaxy. Global MQW strain, period, and the tilt of the (00.1) crystallographic planes have been measured across the sidewall facets using a 240 nm x-ray beam. Results of this study are interpreted in terms of suppressed intrafacet migration of In and Ga precursors during the MQW growth. © 2008 American Institute of Physics.
Identifier
41349099159 (Scopus)
Publication Title
Applied Physics Letters
External Full Text Location
https://doi.org/10.1063/1.2901142
ISSN
00036951
Issue
12
Volume
92
Fund Ref
National Science Foundation
Recommended Citation
Bonanno, P. L.; O'Malley, S. M.; Sirenko, A. A.; Kazimirov, A.; Cai, Z. H.; Wunderer, T.; Brückner, P.; and Scholz, F., "Intrafacet migration effects in InGaN/GaN structures grown on triangular GaN ridges studied by submicron beam x-ray diffraction" (2008). Faculty Publications. 12834.
https://digitalcommons.njit.edu/fac_pubs/12834
