Structural and morphological studies of GaN thin films grown on different oriented LiNbO3 substrates by MOVPE

Document Type

Conference Proceeding

Publication Date

9-1-2008

Abstract

GaN epilayers were grown by metal-organic vapor phase epitaxy (MOVPE) on -and -cut lithium niobate substrates. Ex-situ characterizations of the epilayers by means of scanning electron microscope, atomic force microscope, X-ray diffraction and micro-Raman scattering measurements have revealed same growth features on both substrates. The observation of the morphology shows homogeneous and relatively smooth surface. The shape and density of GaN islands as well as the observed columnar growth mode are not dependent of the orientation of the LN substrates. The X-ray diffraction analysis of 450 nm thick GaN layers grown at 730 °C on - and -cuts showed that both GaN layers reveal the same crystallographic orientation, i.e. -axis orientation normal to the substrate plane and in-plane orientation that coincides with the primary axis of LN substrates. The Raman scattering measurements confirm the growth of an oriented epitaxial GaN layer on LN substrate. Moreover, the deposited layer exhibit a quite good homogeneity, since the Raman spectra recorded for different positions in the layer do not reveal any significant variations in their relative intensities and frequency shifts. © 2008 EDP Sciences.

Identifier

50849107398 (Scopus)

Publication Title

EPJ Applied Physics

External Full Text Location

https://doi.org/10.1051/epjap:2008144

e-ISSN

12860050

ISSN

12860042

First Page

295

Last Page

299

Issue

3

Volume

43

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