Depositing graphene films on solid and perforated substrates

Document Type

Article

Publication Date

9-10-2008

Abstract

Graphene - a monolayer of graphite - has attracted vast interest recently owing to its perfect two-dimensional crystallographic nature and its potential use in a new generation of microelectronic devices. Yet, a deposition method, which results in a large coverage of monolayer thick graphite, is still lacking. By using a chemical mechanical polishing (CMP) method we were able to deposit stress-free graphene on solid and perforated substrates alike, achieving area coverage of hundreds of microns squared. © IOP Publishing Ltd.

Identifier

51349088161 (Scopus)

Publication Title

Nanotechnology

External Full Text Location

https://doi.org/10.1088/0957-4484/19/36/365303

e-ISSN

13616528

ISSN

09574484

Issue

36

Volume

19

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