Residual stress relaxation in GaN/sapphire circular pillars measured by Raman scattering spectroscopy
Document Type
Article
Publication Date
12-1-2008
Abstract
Circular pillar structures of various diameters have been prepared by a focused ion beam (FIB) through a 4-μm-thick epitaxial gallium nitride (GaN) film grown on a sapphire substrate. Micro-Raman scattering is used to measure residual stresses based on the shift of an E2 phonon in the GaN film. Measurements of residual stress profiles are compared to Winkler's elastic formalism for a shear-supported film with proper boundary conditions. The model, optimized at a cleave edge, is compared to the experimental shape of stress variations inside and outside the pillar structures. © 2008 Elsevier B.V.
Identifier
57049125586 (Scopus)
Publication Title
Journal of Crystal Growth
External Full Text Location
https://doi.org/10.1016/j.jcrysgro.2008.09.145
ISSN
00220248
First Page
5321
Last Page
5326
Issue
24
Volume
310
Recommended Citation
Margueron, Samuel H.; Bourson, Patrice; Gautier, Simon; Soltani, Ali; Troadec, David; De Jaeger, Jean Claude; Sirenko, Andrei A.; and Ougazzaden, Abdallah, "Residual stress relaxation in GaN/sapphire circular pillars measured by Raman scattering spectroscopy" (2008). Faculty Publications. 12572.
https://digitalcommons.njit.edu/fac_pubs/12572
