Directed fracture for the fabrication of free-standing multilayered submicrometer structures

Authors

Roberto R. Robaina, CSIC - Instituto de Microelectronica de Barcelona (IMB-CNM)
María José Lõpez-Martínez, CSIC - Instituto de Microelectronica de Barcelona (IMB-CNM)
Jaume Esteve, CSIC - Instituto de Microelectronica de Barcelona (IMB-CNM)
Raquel Perez-Castillejos, New Jersey Institute of Technology
José Antonio Plaza, CSIC - Instituto de Microelectronica de Barcelona (IMB-CNM)

Document Type

Article

Publication Date

3-7-2011

Abstract

Microdevices are fractured at specific sites to fabricate free-standing multilayered submicrometer structures, which consist of the microdevice cross sections that become exposed after fracture. As determined by finite-element modeling, the microdevices feature a fracturing point where stress concentrates under applied pulling forces. The structures fabricated here have a core of phosphosilicate glass surrounded by a layer of polycrystalline silicon. © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Identifier

79952212052 (Scopus)

Publication Title

Small

External Full Text Location

https://doi.org/10.1002/smll.201001105

e-ISSN

16136829

ISSN

16136810

PubMed ID

21370454

First Page

558

Last Page

562

Issue

5

Volume

7

Recommended Citation

Robaina, Roberto R.; Lõpez-Martínez, María José; Esteve, Jaume; Perez-Castillejos, Raquel; and Plaza, José Antonio, "Directed fracture for the fabrication of free-standing multilayered submicrometer structures" (2011). Faculty Publications. 11426.
https://digitalcommons.njit.edu/fac_pubs/11426