Reversible degradation of photoluminescence in Si/SiGe three dimensional nanostructures
Document Type
Conference Proceeding
Publication Date
12-1-2011
Abstract
We report the degradation of low temperature photoluminescence (PL) from Si/SiGe three-dimensional cluster morphology nanostructures under continuous photoexcitation. The PL intensity initially decreases slowly for about 15 minutes, and then decreases rapidly, until only ∼ 10% of the original PL intensity remains. A complete recovery of the PL requires restoring the sample temperature to - 300K. We propose that a slow accumulation of charge in SiGe clusters enhances the rate of Auger recombination and results in the observed PL degradation. © 2012 Materials Research Society.
Identifier
84879481132 (Scopus)
ISBN
[9781627482233]
Publication Title
Materials Research Society Symposium Proceedings
External Full Text Location
https://doi.org/10.1557/opl.2012.730
ISSN
02729172
First Page
43
Last Page
48
Volume
1409
Fund Ref
National Science Foundation
Recommended Citation
Modi, Nikhil; Tsybeskov, Leonid; Lockwood, David J.; Wu, Xiao Z.; and Baribeau, Jean Marc, "Reversible degradation of photoluminescence in Si/SiGe three dimensional nanostructures" (2011). Faculty Publications. 11027.
https://digitalcommons.njit.edu/fac_pubs/11027
