Modeling and analysis of dual-arm cluster tools for wafer fabrication with revisiting
Document Type
Conference Proceeding
Publication Date
12-5-2011
Abstract
Some wafer fabrication processes are repeated processes, e.g. atomic layer deposition (ALD) process. For such processes, the wafers need to visit some processing modules for a number of times, which complicates the cycle time analysis. This paper studies the cycle time analysis problem for such processes. With a Petri net model, it is found that such processes contain local cycles involving only the revisiting PMs and global cycles involving both revisiting and non-revisiting PMs. The process switches between these two types of cycles such that the process never reaches a steady state. Based on this finding, the mechanism underlying such processes is revealed and analytical expressions are given for the calculation of their cycle time. Illustrative examples are presented to show the application of the proposed approach. © 2011 IEEE.
Identifier
82455192498 (Scopus)
ISBN
[9781457717307]
Publication Title
IEEE International Conference on Automation Science and Engineering
External Full Text Location
https://doi.org/10.1109/CASE.2011.6042403
e-ISSN
21618089
ISSN
21618070
First Page
90
Last Page
95
Recommended Citation
Qiao, Yan; Wu, Nai Qi; and Zhou, Meng Chu, "Modeling and analysis of dual-arm cluster tools for wafer fabrication with revisiting" (2011). Faculty Publications. 10975.
https://digitalcommons.njit.edu/fac_pubs/10975
