The effect of the nature of substrate (Ge, Si and SnO2) on the band gap of TiO2 ultra-thin films: A promising new nanomaterial for solar energy technologies and the photocatalytic activity
Document Type
Article
Publication Date
1-1-2017
Abstract
Achieving an optimal band gap is a crucial step towards achieving efficiency and sustainability in many technological applications. In the present work, a computational investigation is carried out to explore the stability and the electronic properties of bulk and ultra-thin layers of TiO2 materials on a variety of substrates. The results show that the band structure of Titania-based materials can be tuned by designing ultra-thin layer devices that can affect the interatomic distances in a substrate engineering approach. Going from a band gap of about 3.0 eV for Bulk TiO2, a variety of layerings on different substrates is shown to yield a band gap in the 1.2–3.3 eV range. A titania multilayer device on tin oxide substrate is shown to lead to the important band gap of 1.2 eV, such a scheme can have tremendous applications for solar energy technologies and the photocatalytic activity of TiO2.
Identifier
85020543297 (Scopus)
Publication Title
Solar Energy
External Full Text Location
https://doi.org/10.1016/j.solener.2017.06.018
ISSN
0038092X
First Page
18
Last Page
24
Volume
155
Recommended Citation
Salmani, E.; Laghrissi, A.; Rouchdi, M.; Benchafia, E.; Ez-Zahraouy, H.; Hassanain, N.; Mzerd, A.; and Benyoussef, A., "The effect of the nature of substrate (Ge, Si and SnO2) on the band gap of TiO2 ultra-thin films: A promising new nanomaterial for solar energy technologies and the photocatalytic activity" (2017). Faculty Publications. 10072.
https://digitalcommons.njit.edu/fac_pubs/10072
